Webinar Topic #1: SEMI Standards Enabling Proactive Yield Management for Advanced Nodes - Particles Control
This webinar describes the SEMI Standards enabling advanced processes contamination control and provides a case study of the use of specific SEMI Standards to address pressing industry needs.
The webinar has been recorded with the goal of assisting semiconductor and supply chain professionals involved in the many aspects of contamination control, including UPW and liquid chemical suppliers dealing with liquid treatment and delivery systems.
Technical Background
Advanced semiconductor manufacturing has reached the current limits of metrology measuring contamination on both the wafers and in the high purity materials. Furthermore, ability of the most advanced filters to control particles in sub-10nm range is also limited. Finally, particle shedding of sub-10nm particles from high-purity components located post-filter cannot be directly measured and only be estimated using power-law extrapolation.
The Liquid Chemical Technical Committee - within the SEMI Standards Program - works closely with the Yield Enhancement IFT - an internationally-focused team within the IRDS - to establish the methodology to enable proactive technology management in the space of contamination control.
If you have any questions regarding the SEMI Standards mentioned in this webinar or would like to participate in standards development, please contact:
Slava Libman, FTD Solutions | [email protected]
Gary Van Schooneveld, CT Associates, Inc | [email protected]
Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems
Specification for Polymer Materials and Components Used in Ultrapure Water and Liquid Chemical Distribution Systems
Guide for Ultrapure Water Used in Semiconductor Processing
Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System
Guide to Design and Operation of a Semiconductor Ultrapure Water System
Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing
Test Method for Evaluation of Particle Contribution of Components Used in Ultrapure Water and Liquid Chemical Distribution Systems
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